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71.
72.
In photochemical vapor deposition of aluminum film on silicon using dimethylaluminum hydride, (CH3)2AlH, a surface reaction dominated below a (CH3)2AlH pressure of 0.3 m Torr at 200°C, which was induced only with the 160 nm band emitted from a deuterium lamp. A gas-phase reaction occurred above 0.3 mTorr at 200°C, which could be induced by both 160 nm and 240 nm emission bands from the lamp. To distinguish between surface ad gas-phase reactions, a thickness profile was used. At 240°C the surface reaction could be induced even by the 240 nm band, while the deposits formed under illumination of the two bands were thinner than those obtained with only the 240 nm band, indicating occurrence of vacuum ultraviolet (VUV)-enhanced desorption. The mechanism responsible for the observed wavelength dependence in unclear. The electrical resistivity of the films deposited at 200°C was 4.5 μΩ cm, which did not change with wavelength. 相似文献
73.
本文论述应用光学薄膜技术对汽车窗口玻璃和塑料的若干性能进行改进的技术发展水平,这些性能包括塑料表面的硬化,红外区的反射,紫外区的吸收,偏振化作用,双折射,憎水性以及光学角度选择性等,评论等离子体处理和物理蒸汽淀积薄膜工艺近来应用的一些例子。对于物理蒸汽淀积薄膜所提供的异常功能连同实际使用中它们的耐久性作了特殊的强调。 相似文献
74.
We derive and analyse four algorithms for computing the current induced on a thin straight wire by a transient electric field.
They all involve solving the thin wire electric field integral equations (EFIEs) and consist of a very accurate differential
equations solver together with various schemes to approximate the vector potential integral equation. We carry out a rigorous
numerical stability analysis of each of these methods. This has not previously been done for solution schemes for the thin
wire EFIEs. Each scheme is shown to be stable and convergent provided the radius of the wire is small enough for the thin
wire equations to be a valid model. 相似文献
75.
The electron-stimulated desorption (ESD) of D− and H− ions from condensed D2O and H2O films is investigated. Three low-energy peaks are observed in the ESD anion yield, which are identified as arising from excitation of 2B1, 2A1 and 2B2 dissociative electron attachment (DEA) resonances. Additional structure is observed between 18 and 32 eV, which may be due to ion pair formation or to DEA resonances involving the 2a1 orbital. The ion yield resulting from excitation of the 2B1 resonance increases as the film is heated. We attribute the increase in the ion yield to thermally induced hydrogen bond breaking near the surface, which enhances the lifetimes of the excited states that lead to desorption. 相似文献
76.
77.
Serge Palacin Christophe Bureau Julienne Charlier Guy Deniau Brigitte Mouanda Pascal Viel 《Chemphyschem》2004,5(10):1468-1481
Electrografting is a powerful and versatile technique for modifying and decorating conducting surfaces with organic matter. Mainly based on the electro-induced polymerization of dissolved electro-active monomers on metallic or semiconducting surfaces, it finds applications in various fields including biocompatibility, protection against corrosion, lubrication, soldering, functionalization, adhesion, and template chemistry. Starting from experimental observations, this Review highlights the mechanism of the formation of covalent metal-carbon bonds by electro-induced processes, together with major applications such as derivatization of conducting surfaces with biomolecules that can be used in biosensing, lubrication of low-level electrical contacts, reversible trapping of ionic waste on reactive electrografted surfaces as an alternative to ion-exchange resins, and localized modification of conducting surfaces, a one-step process providing submicrometer grafted areas and which is used in microelectronics. 相似文献
78.
采用溶胶-凝胶法在Pt/Ti/SiO2/Si衬底上制备了不同La掺杂浓度PLZT(x/40/60)薄膜- x射线衍射分析表明制备的PLZT(x/40/60)薄膜是具有单一钙钛矿结构的多晶薄膜- 通过红外椭圆偏振光谱仪测量了波长为2-5—12-6μm范围内PLZT薄膜的椭偏光谱,采用经典色 散模型拟合获得PLZT薄膜的红外光学常数,同时也拟合获得PLZT薄膜的厚度- 随着La掺杂浓 度的增大,折射率逐渐减小- 而消光系数除PLZT(4/40/60)薄膜外,呈现逐渐增大的趋势- 分析表明这些差异主要与PLZ
关键词:
PLZT薄膜
红外光学性质
红外椭圆偏振光谱 相似文献
79.
Guosong Wu Xiaoqin Zeng Wenbin Ding Xingwu Guo Shoushan Yao 《Applied Surface Science》2006,252(20):7422-7429
Ceramic thin films have been widely used to protect the metal substrate as coatings in the past years. In order to improve the poor corrosion resistance of AZ31 magnesium alloy, the study in this paper used the electron beam evaporation method to prepare ceramic PVD films on its surface with TiO2 and Al2O3 as donors, respectively. Atomic force microscopy (AFM), scanning electron microscope (SEM), energy dispersive X-ray spectrometer (EDS), Auger electron spectroscopy (AES) and X-ray diffraction (XRD) were used to investigate the surface morphology, composition and microstructure of the thin films. Both films deposited on AZ31 took on compact top surface morphologies and grew as amorphous structures on substrate. AES test not only showed that films compositions deviated the standard stoichiometric ratios, but also found that element Mg diffused into films and existed as magnesium oxide in the TiOx film as well as the AlOx film. In the electrochemical corrosion test, the AlOx coating on AZ31 exhibited the largest electrochemical impedance in a 3.5% NaCl solution. But it did not show better corrosion resistance than others for the poorer adhesion. Even if its thickness was small, the TiOx coating on AZ31 exhibited the best corrosion resistance in this study. According to the observation and analysis, the damage of these films on AZ31 in aggressive solutions was mainly due to the existence of pores, microcracks, vacancies and poor adhesion between coating and substrate. 相似文献
80.
Yunshan Dong 《Applied Surface Science》2006,252(14):5057-5062
A series of Zr-Si-N composite films with different Si contents were synthesized in an Ar and N2 mixture atmosphere by the bi-target reactive magnetron sputtering method. These films’ composition, microstructure and mechanical properties were characterized by energy dispersive spectroscopy, X-ray diffraction, scanning electron microscopy, atomic force microscopy and nanoindentation. Experimental results revealed that after the addition of silicon, Si3N4 interfacial phase formed on the surface of ZrN grains and prevented them from growing up. Zr-Si-N composite films were strengthened at low Si content with the hardness and elastic modulus reaching their maximum values of 29.8 and 352 GPa at 6.2 at% Si, respectively. With a further increase of Si content, the crystalline Zr-Si-N films gradually transformed into amorphous, accompanied with a remarkable fall of films’ mechanical properties. This limited enhancement of mechanical properties in the Zr-Si-N films may be due to the low wettability of Si3N4 on the surface of ZrN grains. 相似文献